Nonvolatile memory devices and methods of forming the same

ABSTRACT

Nonvolatile memory devices and methods of forming the same are provided, the nonvolatile memory devices may include first regions and second regions which extend in a first direction and are alternately disposed in a semiconductor substrate along a second direction crossing the first direction. Buried doped lines are formed at the first regions respectively and extend in the first direction. The buried doped lines may be doped with a dopant of a first conductivity type. Bulk regions doped with a dopant of a second conductivity type and device isolation patterns are disposed along the second direction. The bulk regions and the device isolation patterns may be formed in the second regions. Word lines crossing the buried doped lines and the bulk regions are formed parallel to one another. Contact structures are connected to the buried doped lines and disposed between the device isolation patterns.

CROSS-REFERENCE TO RELATED APPLICATIONS

This U.S. non-provisional patent application is a continuationapplication of U.S. application Ser. No. 12/588,316, filed on Oct. 13,2008, now allowed, which claims the benefit of priority under 35 U.S.C.§119 from Korean Patent Application No. 2008-100303, filed on Oct. 13,2008, the entire contents of each of which is incorporated herein byreference.

BACKGROUND

1. Field

Example embodiments disclosed herein relate to semiconductor devices andmethods of forming the same. Other example embodiments relate tononvolatile memory devices and methods of forming the same.

2. Description of Related Art

As the integration of a semiconductor device increases, the width ofpatterns and spaces between the patterns are reduced. A reduction in thewidth of patterns, or in the spaces between the patterns, results in anincrease in the costs associated with manufacturing a semiconductordevice. Exposure equipment that uses a corresponding short wavelengthmay be necessary to form a pattern having a reduced line width. However,exposure equipment that produces a pattern having a reduced line widthis costly, thereby increasing the costs associated with manufacturingthe semiconductor device.

A reduction in the width of the patterns and the spaces of the patternscauses a variety of difficulties in manufacturing a semiconductordevice. For example, a reduction in the space between gate patternsmakes it difficult to form a source plug and a drain plug connected to asource electrode and a drain electrode, respectively, of a transistor.Because a bit line is formed to cross a source line, the bit line is notformed on the same layer as the source line. And, at least one of thebit line and the source line is connected to a drain electrode or asource electrode through plugs. In this case, a space between the gatepatterns should be formed wide enough to prevent (or reduce thelikelihood of) a short between a plug and a gate electrode. Thenecessity of wide space hinders the ability to form a more integratedsemiconductor device.

In the case of a conventional NOR-type flash memory device, because thesource electrodes are connected to one another through a buried sourceline, the number of source plugs may be reduced. Because the drainelectrodes of cells are connected to a bit line through drain plugs, aNOR-type flash memory device has a lower degree of integration than aNAND-type flash memory device.

Methods that reduce the number of drain plugs have been studied.

SUMMARY

Example embodiments disclosed herein relate to semiconductor devices andmethods of forming the same. Other example embodiments relate tononvolatile memory devices and methods of forming the same.

Example embodiments provide a nonvolatile memory device including firstregions and second regions extending in a first direction. The first andsecond regions may be alternately disposed in a semiconductor substratealong a second direction crossing the first direction. The nonvolatilememory device includes buried doped lines formed at the first regionsrespectively and extending in the first direction. The buried dopedlines may be doped with a dopant of a first conductivity type. Thenon-volatile memory device includes bulk regions doped with a dopant ofa second conductivity type and device isolation patterns disposed alongthe second direction. The bulk regions and the device isolation patternsmay be formed in the second regions. Word lines crossing the burieddoped lines and the bulk regions may be formed parallel to one another.Contact structures may be connected to the buried doped lines anddisposed between the device isolation patterns.

Other example embodiments provide a method of forming a nonvolatilememory device. The method may include providing a semiconductorsubstrate including first regions and second regions extended in a firstdirection. The first and second regions may be alternately disposedalong a second direction crossing the first direction. Bulk regionsdoped with a dopant of a second conductivity type, and device isolationpatterns, may be formed disposed along a second direction crossing thefirst direction. The bulk regions and the device isolation patterns maybe formed in the second regions. Buried doped lines may be formed at thefirst regions respectively and extend in the first direction. The burieddoped lines may be doped with a dopant of a first conductivity type.Word lines crossing the buried doped lines and the bulk regions may beformed parallel to one another. Contact structures may be connected tothe buried doped lines between the device isolation patterns.

BRIEF DESCRIPTION OF THE FIGURES

Example embodiments will be more clearly understood from the followingdetailed description taken in conjunction with the accompanyingdrawings. FIGS. 1-11 represent non-limiting, example embodiments asdescribed herein.

FIG. 1 is a top plan view of a nonvolatile memory device according toexample embodiments.

FIG. 2 is a cross sectional view taken along the line I-I′ of FIG. 1.

FIG. 3 is a cross sectional view taken along the line II-II′ of FIG. 1.

FIG. 4 is a cross sectional view taken along the line III-III′ of FIG.1.

FIG. 5 is a top plan view of a nonvolatile memory device according toexample embodiments.

FIG. 6 is a cross sectional view taken along the line VI-VI′ of FIG. 5.

FIGS. 7 a through 9 c are views illustrating a method of forming anonvolatile memory device according to example embodiments.

FIGS. 7 b, 8 b and 9 b are cross sectional views taken along the lineV-V′ of FIGS. 7 a, 8 a and 9 a, respectively.

FIGS. 7 c, 8 c and 9 c are cross sectional views taken along the lineVI-VI′ of FIGS. 7 a, 8 a and 9 a, respectively.

FIG. 10 is a block diagram of an electronic system including anonvolatile memory device according to example embodiments.

FIG. 11 is a blocking diagram of a memory card including a nonvolatilememory device according to example embodiments.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

Various example embodiments will now be described more fully withreference to the accompanying drawings in which some example embodimentsare shown. However, specific structural and functional details disclosedherein are merely representative for purposes of describing exampleembodiments. Thus, the invention may be embodied in many alternate formsand should not be construed as limited to only example embodiments setforth herein. Therefore, it should be understood that there is no intentto limit example embodiments to the particular forms disclosed, but onthe contrary, example embodiments are to cover all modifications,equivalents, and alternatives falling within the scope of the invention.

In the drawings, the thicknesses of layers and regions may beexaggerated for clarity, and like numbers refer to like elementsthroughout the description of the figures.

Although the terms first, second, etc. may be used herein to describevarious elements, these elements should not be limited by these terms.These terms are only used to distinguish one element from another. Forexample, a first element could be termed a second element, and,similarly, a second element could be termed a first element, withoutdeparting from the scope of example embodiments. As used herein, theterm “and/or” includes any and all combinations of one or more of theassociated listed items.

It will be understood that, if an element is referred to as being“connected” or “coupled” to another element, it can be directlyconnected, or coupled, to the other element or intervening elements maybe present. In contrast, if an element is referred to as being “directlyconnected” or “directly coupled” to another element, there are nointervening elements present. Other words used to describe therelationship between elements should be interpreted in a like fashion(e.g., “between” versus “directly between,” “adjacent” versus “directlyadjacent,” etc.).

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of exampleembodiments. As used herein, the singular forms “a,” “an” and “the” areintended to include the plural forms as well, unless the context clearlyindicates otherwise. It will be further understood that the terms“comprises,” “comprising,” “includes” and/or “including,” if usedherein, specify the presence of stated features, integers, steps,operations, elements and/or components, but do not preclude the presenceor addition of one or more other features, integers, steps, operations,elements, components and/or groups thereof.

Spatially relative terms (e.g., “beneath,” “below,” “lower,” “above,”“upper” and the like) may be used herein for ease of description todescribe one element or a relationship between a feature and anotherelement or feature as illustrated in the figures. It will be understoodthat the spatially relative terms are intended to encompass differentorientations of the device in use or operation in addition to theorientation depicted in the figures. For example, if the device in thefigures is turned over, elements described as “below” or “beneath” otherelements or features would then be oriented “above” the other elementsor features. Thus, for example, the term “below” can encompass both anorientation that is above, as well as, below. The device may beotherwise oriented (rotated 90 degrees or viewed or referenced at otherorientations) and the spatially relative descriptors used herein shouldbe interpreted accordingly.

Example embodiments are described herein with reference tocross-sectional illustrations that are schematic illustrations ofidealized embodiments (and intermediate structures). As such, variationsfrom the shapes of the illustrations as a result, for example, ofmanufacturing techniques and/or tolerances, may be expected. Thus,example embodiments should not be construed as limited to the particularshapes of regions illustrated herein but may include deviations inshapes that result, for example, from manufacturing. For example, animplanted region illustrated as a rectangle may have rounded or curvedfeatures and/or a gradient (e.g., of implant concentration) at its edgesrather than an abrupt change from an implanted region to a non-implantedregion. Likewise, a buried region formed by implantation may result insome implantation in the region between the buried region and thesurface through which the implantation may take place. Thus, the regionsillustrated in the figures are schematic in nature and their shapes donot necessarily illustrate the actual shape of a region of a device anddo not limit the scope.

It should also be noted that in some alternative implementations, thefunctions/acts noted may occur out of the order noted in the figures.For example, two figures shown in succession may in fact be executedsubstantially concurrently or may sometimes be executed in the reverseorder, depending upon the functionality/acts involved.

In order to more specifically describe example embodiments, variousaspects will be described in detail with reference to the attacheddrawings. However, the present invention is not limited to exampleembodiments described.

Example embodiments disclosed herein relate to semiconductor devices andmethods of forming the same. Other example embodiments relate tononvolatile memory devices and methods of forming the same.

FIG. 1 is a top plan view of a nonvolatile memory device according toexample embodiments. FIG. 2 is a cross sectional view taken along theline I-I′ of FIG. 1. FIG. 3 is a cross sectional view taken along theline II-II′ of FIG. 1. FIG. 4 is a cross sectional view taken along theline III-III′ of FIG. 1.

Referring to FIGS. 1 and 2, first regions 100 a and second regions 100 bwhich extend parallel to each other along a first direction andalternately disposed in a second direction crossing the first direction,are provided in a semiconductor substrate 100. As depicted in FIG. 1,the first direction corresponds to the direction extending along they-axis and the second direction corresponds to the direction extendingalong the x-axis. Buried doped lines 110 are disposed on the firstregions 100 a respectively. The buried doped lines 110 extend in thefirst direction and include a dopant of a first conductivity type. Theburied doped lines 110 may be disposed on a surface of the semiconductorsubstrate 100. Top surfaces of the buried doped lines 110 may besubstantially coplanar with a top surface of the semiconductor substrate100. The first conductivity type may be an n-type impurity.

Bulk regions 102 and device isolation patterns 105 are disposed in thesecond regions 100 b. The bulk regions 102 may include a dopant of asecond conductivity type. The device isolation patterns 105 are disposedalong the second direction crossing the first direction. The bulkregions 102 are regions in which the device isolation patterns 105 arenot disposed. The second conductivity type may be a p-type impurity. Thedevice isolation patterns 105 may include a silicon oxide layer. Wordlines 120 may cross the buried doped lines 110 and the bulk regions 102.Contact structures 135 may be connected to the buried doped lines 110.The contact structures 135 may be disposed between the device isolationpatterns 105.

The device isolation patterns 105 are disposed in the semiconductorsubstrate 100 along the second direction. The device isolation patterns105 may be a silicon oxide layer. For example, the device isolationpatterns 105 may include a HDP oxide layer formed using a high densityplasma (HDP) technique, a spin-on-glass (SOG) layer, a mediumtemperature oxide (MTO) layer, a high temperature oxide (HTO) layer, anundoped silicon layer and/or an undoped germanium layer.

The device isolation patterns 105 may include a silicon oxide layer (notshown) formed in inner wall of a trench 106 through a thermal oxidationprocess. The device isolation patterns 105 may include a liner (notshown) covering an inner wall of the trench 106. The liner may be amaterial (e.g., a silicon nitride layer) which prevents impurities frompenetrating into the semiconductor substrate 100.

A portion of the buried doped lines 110 is disposed between the deviceisolation patterns 105. The other portion of the buried doped lines 110is disposed between the bulk regions 102. The buried doped lines 110 maybe used as source electrodes of the word lines 120, drain electrodes ofthe word lines 120, source lines connecting the source electrodes andbit lines connecting the drain electrodes. A unit cell of thenonvolatile memory device may include two buried doped lines 110. One ofthe two buried doped lines 110 may be used as a source region and asource line, and the other of the two buried doped lines 110 may be usedas a drain region and a bit line.

A first interlayer insulating layer 132 covering the word lines 120 andthe device isolation patterns 105 is provided. Contact structures 135connected to the buried doped lines 110 between the device isolationpatterns 105 may be disposed in the first interlayer insulating layer132. The width of the buried doped lines 110 to which the contactstructures 135 are connected may be defined by the device isolationpatterns 105. The contact structures 135 may include a first silicidelayer 115 which is in contact with the buried doped lines 110 and ametal contact 130 connected to the first silicide layer 115. The firstsilicide layer 115 is provided for an ohmic contact of the buried dopedlines 110 and the metal contact 130.

Even if widths of the second direction of the buried doped lines 110 aresmaller than widths of the second direction of the contact structures135, a short between the contact structures 135 and the semiconductorsubstrate 100 may be prevented (or the likelihood reduced) by the deviceisolation patterns 105. As the widths of the buried doped lines 110 inthe second direction are reduced, a scaling down may be possible. Asecond interlayer insulating layer 142 is provided onto (or on) thefirst interlayer insulating layer 132. Global bit lines 140, which areconnected to the contact structures 135 and extend in the firstdirection, are provided onto (or on) the second interlayer insulatinglayer 142.

A resistance characteristic of a nonvolatile memory device according toexample embodiments increases due to the first silicide layer 115. Thefirst silicide layer 115 may be self-aligned on the buried doped lines110 by the device isolation patterns 115.

Referring to FIGS. 3 and 4, a top surface of the bulk region 102 of thesemiconductor substrate 100 may be coplanar with a top surface of theburied doped line 110. The word lines 120 may include a tunnelinsulating layer 121, a charge storage layer 122, a dielectric layer 123and a gate electrode 124 that are sequentially stacked on thesemiconductor substrate 100. The charge storage layer 122 may be afloating gate or a charge trap layer. For example, the charge trap layermay be a silicon nitride layer having a high charge trap density or ahigh dielectric layer having a high charge trap density. The dielectriclayer 123 may be an integrated insulating layer if the charge storagelayer 122 is a floating gate and may be a blocking insulating layerpreventing charges from leaking into the gate electrode 124 if thecharge storage layer 122 is a charge trap layer. If the gate electrode124 includes polysilicon, the word lines 120 may further include asecond silicide layer 125 on the gate electrode 124.

The word line 120 directly adjacent to the contact structures 135 maycover a portion of the device isolation pattern 105. The deviceisolation pattern 105 is disposed at one side of the adjacent word line120 and the buried doped line 110. The bulk region 102 are disposed atthe other side of the adjacent word line 120 facing the one side. Thisarrangement prevents a silicide layer from being disposed between theword line 120 directly adjacent to the contact structure 135 and thedevice isolation pattern 105. The word line 120 directly adjacent to thecontact structure 135 may be used as a dummy word line. A spacer 127 isdisposed on a sidewall of the word line 120. The spacer 127 may includea silicon oxide layer, a silicon nitride layer, a silicon oxynitridelayer or combinations thereof. The spacers 127 may cover the burieddoped lines 120 and the bulk regions 102 between the word lines 120 sothat the buried doped lines 120 and the bulk regions 102 are notexposed.

FIG. 5 is a top plan view of a nonvolatile memory device according toexample embodiments. FIG. 6 is a cross sectional view taken along theline VI-VI′ of FIG. 5.

Referring to FIGS. 5 and 6, unlike in FIGS. 1 and 4, word lines 120adjacent to the contact structures 135 may not cover the deviceisolation patterns 105 and may be spaced apart from one another. Thespacer 127 may cover a buried doped line 110 and a bulk region 102between the adjacent word line 120 and the device isolation pattern 105.This arrangement prevents a silicide layer from being disposed at theseparated portion. The word lines 120 directly adjacent to the contactstructures 135 may not be used as dummy word lines unlike other exampleembodiments.

According to example embodiments, the device isolation patterns 105 aredisposed between the contact structures 135. A first silicide layer 115may be self aligned on the buried doped patterns 110 by the deviceisolation patterns 105. An interconnection resistance may be reduced bya disposal of the first silicide layer 115. A short between thesemiconductor substrate 100 and the contact structures 135 may beprevented by the device isolation patterns 105. The second silicidelayer 125 is disposed on the gate electrode 124 of the word lines 120 toreduce a resistance between the word line 120 and a metalinterconnection, which is connected to the word line 120.

Referring to FIGS. 7 a through 9 c, a method of forming a nonvolatilememory device according to example embodiments will be described. FIGS.7 b, 8 b and 9 b are cross sectional views taken along the line V-V′ ofFIGS. 7 a, 8 a and 9 a, respectively. FIGS. 7 c, 8 c and 9 c are crosssectional views taken along the line VI-VI′ of FIGS. 7 a, 8 a and 9 a,respectively.

Referring to FIGS. 7 a, 7 b and 7 c, a semiconductor substrate 100including first regions 100 a and second regions 100 b which extend in afirst direction (e.g., along the y-axis) and alternately disposed isprovided. Buried doped lines 110 formed in the first regions 100 a,extending in the first direction and doped with a dopant of a firstconductivity type, are formed. The dopant of a first conductivity typemay be an n-type. The buried doped lines 110 may be formed by performingan ion implantation process using an ion implantation mask (not shown)extending in the first direction.

Bulk regions 102 doped with a dopant of a second conductivity type anddevice isolation patterns 105 disposed to extend in a second direction(e.g., along the x-axis) crossing the first direction are formed in thesecond regions 100 b. The bulk region 102 is a region in which thedevice isolation patterns are not disposed. The dopant of a secondconductivity type may be a p-type.

Forming the device isolation patterns 105 may include forming a trench106 in the semiconductor substrate 100 and forming an insulating layer(not shown) filling the trench 106. The insulating layer may, forexample, be a silicon oxide layer. The device isolation patterns 105 mayinclude a liner oxide layer (not shown) formed by applying a thermaloxidation process to an inner wall of the trench 106. The deviceisolation patterns 105 may include a liner nitride layer (not shown)formed to cover at least the inner wall of the trench 106. The linernitride layer may prevent impurities from penetrating into thesemiconductor substrate 100.

The device isolation patterns 105 are formed, followed by forming theburied doped lines 110. The device isolation patterns 105 are formed atregular intervals, followed by arranging the buried doped lines 110between the device isolation patterns 105 using an ion implantationprocess. As such, a distance between the device isolation patterns 105may define a width (W₁, a width measured along a second directioncrossing the first direction) of the buried doped line 110 between thedevice isolation patterns 105.

Referring to FIGS. 8 a, 8 b and 8 c, word lines 120 crossing the burieddoped lines 110 and the bulk regions 102 in parallel to one another areformed. The word lines 120 may be formed of a tunnel insulating layer121, a charge storage layer 122, a dielectric layer 123 and a gateelectrode 124 that are sequentially stacked on the semiconductorsubstrate 100. The gate electrode 124 may be formed of polysilicon.

A spacer 127 is formed on a sidewall of the word line 120. The spacer127 may be formed of a silicon oxide layer, a silicon nitride layer, asilicon oxynitride layer or a combination thereof. An insulating layeris deposited using a chemical vapor deposition (CVD) process, followedby performing an anisotropic etching process. As such, the spacer 127may be formed. After forming the spacer 127, a first silicide layer 115is formed on the buried doped lines 110 between the device isolationpatterns 105. Forming the first silicide layer 115 may include forming ametal layer covering the word lines 120 and the buried doped lines 110,forming the first silicide layer 115 on the buried doped lines 110 byapplying an annealing process to the metal layer and removing anunreacted metal layer. A space between the word lines 120 may not beexposed by the spacer 127.

If the gate electrode 124 is formed of polysilicon, the word lines 120may include a second silicide layer 125 on the gate electrode 124. Thefirst and second silicide layers 115 and 125 may be formedsimultaneously (or at the same time).

According to example embodiments, the word line 120 directly adjacent tothe device isolation pattern 105 may be formed to cover a portion of thedevice isolation pattern 105. The word line 120 covering a portion ofthe device isolation pattern 105 may be used as a dummy word line. Inother example embodiments, the word line 120 directly adjacent to thedevice isolation pattern 105 may be formed not to cover a portion of thedevice isolation pattern 105 (referring to FIGS. 5 and 6). A separatedspace between the word line 120 directly adjacent to the deviceisolation pattern 105 and the device isolation pattern 105 may becovered by the spacer 127. This arrangement prevents a silicide layerfrom forming in the separated space.

Referring to FIGS. 9 a, 9 b and 9 c, a first interlayer insulating layer132 is formed covering the word lines 120. The first interlayerinsulating layer 132 may be formed of a silicon oxide layer. A metalcontact 130 electrically connected to the first silicide layer 115 isformed on the first interlayer insulating layer 132. The metal contact130 and the first silicide layer 115 may constitute contact structures135. The metal contact 130 and the buried doped lines 110 may constitutean ohmic contact by the first silicide layer 115. A second interlayerinsulating layer 142 is formed on the first interlayer insulating layer132. Global bit lines 140 connected to the contact structures 135 areformed on the second interlayer insulating layer 142. The global bitlines 140 may extend in the first direction and may have a lowinterconnection resistance by the first silicide layer 115.

According to example embodiments, the first silicide layer 115 may beformed by using the device isolation patterns 105. The first silicidelayer 115 may be self-aligned with the buried doped lines 110 by thedevice isolation patterns 105. Even if the contact structures 135 aremisaligned, the device isolation patterns 105 may prevent (or reduce thelikelihood of) a short between the semiconductor substrate 100 and thecontact structures 135. A silicide process according to exampleembodiments and a silicide process of a transistor disposed at aperipheral region of the nonvolatile memory device may be performedsimultaneously.

FIG. 10 is a block diagram of an electronic system including anonvolatile memory device according to example embodiments.

Referring to FIG. 10, an electronic system 200 may include a controller210, an input/output device 220 and a memory device 230. The controller210, the input/output device 220 and the memory device 230 may beconnected to one another through a bus 250. The bus 250 may be a paththrough which data transfer. The controller 210 may include at least oneof a micro processor, a digital signal processor, a microcontroller anda logic device having a function similar to the micro processor, thedigital signal processor and the microcontroller. The input/outputdevice 220 may include at least one selected from a keypad, a keyboardand a display device. The memory device 230 is a device storing data.The memory device 230 may store data and/or an instruction executed bythe controller 210. The memory device 230 may include the nonvolatilememory device disclosed in example embodiments. The electronic system200 may include an interface 240 for transmitting data to acommunication network or receiving data from a communication network.The interface 240 may be a wireline/wireless shape. The interface 240may include an antenna or a wireline/wireless transceiver. Theelectronic system 200 may be embodied by a mobile system, a personnelcomputer, an industrial computer or a logic system performing a varietyof functions. For example, the mobile system may be one of a personaldigital assistant (PDA), a portable computer, a web tablet, a mobilephone, a wireless phone, a laptop computer, a memory card, a digitalmusic system and a data transmission/receipt system. If the electronicsystem 200 is a device which performs a wireless communication, theelectronic system 200 may be used in a communication interface protocolof a third generation (e.g., CDMA, GSM, NADC, E-TDMA, CDMA 2000).

FIG. 11 is a blocking diagram of a memory card including a nonvolatilememory device according to example embodiments.

Referring to FIG. 11, a memory card 300 may include a memory device 310and a memory controller 320. The memory device 310 stores data. Thememory device 310 may have nonvolatile characteristics such as theability to maintain stored data even if a power supply is interrupted.The memory device 310 may include the nonvolatile memory devicedisclosed in the described example embodiments. The memory controller320 readouts data stored in the memory device 310 or stores data in thememory device 310 in response to a request of decoding/writing of ahost.

While example embodiments have been particularly shown and describedwith reference to example embodiments thereof, it will be understoodthat various changes in form and details may be made therein withoutdeparting from the spirit and scope of the following claims.

What is claimed is:
 1. A method of forming a nonvolatile memory device,comprising: providing a semiconductor substrate including a plurality offirst regions and a plurality of second regions extending in a firstdirection, the plurality of first regions and the plurality of secondregions being alternately disposed along a second direction crossing thefirst direction; forming a plurality bulk regions doped with a dopant ofa second conductivity type and a plurality of device isolation patternsdisposed along a second direction crossing the first direction, the bulkregions and the device isolation patterns being formed in the secondregions; forming a plurality of buried doped lines each in one of thefirst regions and extending in the first direction, the plurality ofburied doped lines being doped with a dopant of a first conductivitytype; forming a plurality of word lines crossing the plurality of burieddoped lines and the plurality of bulk regions, the plurality of wordlines being parallel to one another; and forming a plurality of contactstructures connected to the plurality of buried doped lines, theplurality of contact structures being between the plurality of deviceisolation patterns, wherein sidewalls of the device isolation patternsdisposed in the first direction overlap with the word lines directlyadjacent to the contact structures.
 2. The method of claim 1, furthercomprising: forming a spacer on a sidewall of each of the plurality ofword lines; forming a metal layer covering the plurality of word linesand the plurality of buried doped lines; forming a first silicide layeron the plurality of buried doped lines by performing an annealingprocess to the metal layer; and removing any unreacted portion of themetal layer, prior to forming the plurality of contact structures,wherein the spacer covers the buried doped lines between two adjacentword lines of the plurality word lines and the bulk regions between thetwo adjacent word lines of the plurality of word lines.
 3. The method ofclaim 2, wherein forming the plurality of contact structures includesforming a metal contact connected to the first silicide layer, whereinthe first silicide layer is in contact with the semiconductor substrate.4. The method of claim 3, wherein forming the plurality of word linesincludes forming a tunnel insulating layer on the semiconductorsubstrate, forming a charge storage layer on the tunnel insulatinglayer, forming a dielectric layer on the charge storage layer, andforming a gate electrode on the dielectric layer.
 5. The method of claim4, further comprising forming a second silicide layer on the gateelectrode.
 6. The method of claim 1, wherein a top surface of theplurality of buried doped lines is formed coplanar with a top surface ofthe plurality of bulk regions.
 7. The method of claim 1, wherein formingthe plurality of contact structures includes forming a first silicidelayer in contact with the semiconductor substrate, and forming a metalcontact connected to the first silicide layer.
 8. The method of claim 7,wherein forming the plurality of word lines includes forming a tunnelinsulating layer on the semiconductor substrate, forming a chargestorage layer on the tunnel insulating layer, forming a dielectric layeron the charge storage layer, and forming a gate electrode on thedielectric layer.
 9. The method of claim 8, further comprising forming asecond silicide layer on the gate electrode.
 10. The method of claim 1,wherein the word line directly adjacent to the contact structurescomprise gate electrodes, and the side walls of the device isolationpatterns disposed in first direction overlap with the gate electrodes.11. The method of claim 10, wherein the word lines directly adjacent tothe contact structures are dummy word lines.
 12. The method of claim 11,wherein the word lines directly adjacent to the contact structurescomprise spacers disposed on sidewalls of the word lines, and the sidewalls of the device isolation patterns disposed in first directionoverlap with the spacers.
 13. The method of claim 12, wherein thespacers comprise first spacers on one sidewall of the word lines andsecond spacers on other sidewall of the word lines, the first spacersare directly adjacent to the contact structures.
 14. The method of claim13, wherein the first spacers at least partially cover the directlyadjacent device isolation patterns and the second spacers cover the bulkregions.
 15. The method of claim 1, wherein the word lines directlyadjacent to the plurality of contact structures are spaced apart fromthe plurality of device isolation layer.